Abstract: The intrinsic properties of two-dimensional (2D) materials often fall short of the requirements for high-performance devices and systems. Additionally, the fabrication of extremely small-sized devices has introduced new demands for high-precision machining of 2D materials. Consequently, post-processing techniques that facilitate the modification of 2D materials, encompassing processes such as thinning, oxidation, reduction, phase transitions, and defect induction, have become imperative for the commercialization of nano-devices founded on 2D materials. This article primarily consolidates several prevalent post-processing techniques for 2D materials, encompassing chemical doping, strain engineering, plasma treatment, and light irradiation. The core principles and distinctive features of these methods are succinctly summarized to elucidate the alterations in the dimensions, structures, and properties of 2D materials following post-processing. Subsequently, the article delves into the application of post-processing techniques for 2D materials in the realm of novel nano-devices. This encompasses enhancements in performance and the development of new devices, with particular emphasis on the pivotal role these techniques play in the evolution of cutting-edge nanoscale memristors. These advancements proffer fresh perspectives for the realization and progression of various electronic devices and computational systems.